This report contains market size and forecasts of High Purity Metal Sputtering Target in global, including the following market information:
Global High Purity Metal Sputtering Target Market Revenue, 2017-2022, 2023-2028, ($ millions)
Global High Purity Metal Sputtering Target Market Sales, 2017-2022, 2023-2028, (Kiloton)
Global top five High Purity Metal Sputtering Target companies in 2021 (%)
The global High Purity Metal Sputtering Target market was valued at million in 2021 and is projected to reach US$ million by 2028, at a CAGR of % during the forecast period.
The U.S. Market is Estimated at $ Million in 2021, While China is Forecast to Reach $ Million by 2028.
Metal Target Segment to Reach $ Million by 2028, with a % CAGR in next six years.
The global key manufacturers of High Purity Metal Sputtering Target include Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Hitachi Metals, Honeywell, Mitsui Mining & Smelting, Sumitomo Chemical and ULVAC, etc. In 2021, the global top five players have a share approximately % in terms of revenue.
MARKET MONITOR GLOBAL, INC (MMG) has surveyed the High Purity Metal Sputtering Target manufacturers, suppliers, distributors and industry experts on this industry, involving the sales, revenue, demand, price change, product type, recent development and plan, industry trends, drivers, challenges, obstacles, and potential risks.
Total Market by Segment:
Global High Purity Metal Sputtering Target Market, by Type, 2017-2022, 2023-2028 ($ Millions) & (Kiloton)
Global High Purity Metal Sputtering Target Market Segment Percentages, by Type, 2021 (%)
Metal Target
Alloy Target
Global High Purity Metal Sputtering Target Market, by Application, 2017-2022, 2023-2028 ($ Millions) & (Kiloton)
Global High Purity Metal Sputtering Target Market Segment Percentages, by Application, 2021 (%)
Semiconductor
Solar Energy
Flat Panel Display
Others
Global High Purity Metal Sputtering Target Market, By Region and Country, 2017-2022, 2023-2028 ($ Millions) & (Kiloton)
Global High Purity Metal Sputtering Target Market Segment Percentages, By Region and Country, 2021 (%)
North America
US
Canada
Mexico
Europe
Germany
France
U.K.
Italy
Russia
Nordic Countries
Benelux
Rest of Europe
Asia
China
Japan
South Korea
Southeast Asia
India
Rest of Asia
South America
Brazil
Argentina
Rest of South America
Middle East & Africa
Turkey
Israel
Saudi Arabia
UAE
Rest of Middle East & Africa
Competitor Analysis
The report also provides analysis of leading market participants including:
Key companies High Purity Metal Sputtering Target revenues in global market, 2017-2022 (Estimated), ($ millions)
Key companies High Purity Metal Sputtering Target revenues share in global market, 2021 (%)
Key companies High Purity Metal Sputtering Target sales in global market, 2017-2022 (Estimated), (Kiloton)
Key companies High Purity Metal Sputtering Target sales share in global market, 2021 (%)
Further, the report presents profiles of competitors in the market, key players include:
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Hitachi Metals
Honeywell
Mitsui Mining & Smelting
Sumitomo Chemical
ULVAC
TOSOH
Ningbo Jiangfeng
Heesung
Luvata
Fujian Acetron New Materials
Changzhou Sujing Electronic Material
Luoyang Sifon Electronic Materials
GRIKIN Advanced Material
FURAYA Metals
Advantec
Angstrom Sciences
Umicore Thin Film Products