Photo Acid Generator (PAG) is a kind of compound that can be decomposed to generate specific acid under the irradiation of light, rays, plasma, etc. The generated acid can decompose or cross-link the acid-sensitive resin, thereby Increase the dissolving contrast between the illuminated part and the non-illuminated part. Since photoacid generators (PAGs) form controllable acids under external stimuli, they can be used in the field of photoresists (ie, resists). The downstream of photoacid generator (PAG) is semiconductor photoresist, and the terminal is in many fields of national economy and national defense construction such as consumer electronics, household appliances, information communication, automotive electronics, aerospace, military industry, etc.
Photo Acid Generator (PAG) is divided into ionic type and non-ionic type according to the category, and different application types: Photolithography {EUV (Ionic PAG (Triarylsulfonium salts (Triphenylsulfonium Nonafluorobutanesulfonate (TPS), Tri (4-methoxy- 3-methylphenyl) Sulfonium Nonafluorobutanesulfonate (MMP), Tri (4-methoxy-3-phenylphenyl) Sulfonium Nonafluorobutanesulfonate (MPP), Tri(4-methoxy-3,5-dimethylphenyl) Sulfonium Nonafluorobutanesulfonate (MDP), Non-Ionic PAG (Aryl sulfonates, Sulphones), I-Line {Ionic PAG (Aryldiazonium, Diaryliodonium, Triarylsulfonium, Triarylphosphonium salts, Triamonium salts), Non-Ionic PAG (Diazonapthoquinone (DNQ), Triamonium salts, Imino Sulfonates, N-hydroxyimide sulfonate)}, ArF {Ionic PAG (Triphenylsulfonium perfluorobutanesulfonate (TPSPB), bis(4-tertbutylphenyl) iodonium perfluorobutanesulfonate (BPIPB)), Non-Ionic PAG (Oxime Sulfonate)} KrF {Ionic PAG (Sulfonium Salts), Non-Ionic PAG (Halogen based Compounds, Oxime Sulfonates)}, Photoengraving [{Ionic PAG (Aryldiazonium, Diaryliodonium, Triarylsulfonium, Triarylphosphonium salts, Triamonium Salts} Non-Ionic PAG {2-(4-Methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine (CAS 42573-57-9)}, Printed Circuit Boards {Ionic PAG (Sulfonyldiazomethane)}, Non-Ionic PAG (Aryl sulfonates, Sulphones).
Market Analysis and Insights: Global Photo Acid Generator (PAG) Market
Due to the COVID-19 pandemic, the global Photo Acid Generator (PAG) market size is estimated to be worth US$ million in 2022 and is forecast to a readjusted size of US$ million by 2028 with a CAGR of % during the forecast period 2022-2028. Fully considering the economic change by this health crisis, Ionic accounting for % of the Photo Acid Generator (PAG) global market in 2021, is projected to value US$ million by 2028, growing at a revised % CAGR from 2022 to 2028. While EUV Photoresist segment is altered to an % CAGR throughout this forecast period.
China Photo Acid Generator (PAG) market size is valued at US$ million in 2021, while the US and Europe Photo Acid Generator (PAG) are US$ million and US$ million, severally. The proportion of the US is % in 2021, while China and Europe are % and % respectively, and it is predicted that China proportion will reach % in 2028, trailing a CAGR of % through the analysis period 2022-2028. Japan, South Korea, and Southeast Asia are noteworthy markets in Asia, with CAGR %, %, and % respectively for the next 6-year period. As for the Europe Photo Acid Generator (PAG) landscape, Germany is projected to reach US$ million by 2028 trailing a CAGR of % over the forecast period 2022-2028.
The global key manufacturers of Photo Acid Generator (PAG) include Heraeus, Wako Specialty Chemicals, Tokyo Chemical, San Apro, Changzhou Tronly New Electronic Materials, Toyo Gosei, Nippon Carbide Industries, Fujifilm and Chembridge International Corp. etc. In 2021, the global top five players have a share approximately % in terms of revenue.
In terms of production side, this report researches the Photo Acid Generator (PAG) capacity, production, growth rate, market share by manufacturers and by region (region level and country level), from 2017 to 2022, and forecast to 2028.
In terms of sales side, this report focuses on the sales of Photo Acid Generator (PAG) by region (region level and country level), by company, by Type and by Application. from 2017 to 2022 and forecast to 2028.
Global Photo Acid Generator (PAG) Scope and Segment
Photo Acid Generator (PAG) market is segmented by Type and by Application. Players, stakeholders, and other participants in the global Photo Acid Generator (PAG) market will be able to gain the upper hand as they use the report as a powerful resource. The segmental analysis focuses on production capacity, revenue and forecast by Type and by Application for the period 2017-2028.
Segment by Type
Ionic
Non-ionic
Segment by Application
EUV Photoresist
I-Line Photoresist
ArF Photoresist
KrF Photoresist
G-line Photoresist
By Company
Heraeus
Wako Specialty Chemicals
Tokyo Chemical
San Apro
Changzhou Tronly New Electronic Materials
Toyo Gosei
Nippon Carbide Industries
Fujifilm
Chembridge International Corp
Production by Region
North America
Europe
China
Japan
Consumption by Region
North America
United States
Canada
Europe
Germany
France
U.K.
Italy
Russia
Asia-Pacific
China
Japan
South Korea
India
Australia
China Taiwan
Indonesia
Thailand
Malaysia
Latin America
Mexico
Brazil
Argentina
Colombia
Middle East & Africa
Turkey
Saudi Arabia
UAE